Albert Guerrero is one of the engineers of the Nanolithography Laboratory at the Clean-Room of the IMB-CNM-CSIC.
Albert graduated in Nanoscience and Nanotechnology at the Universitat Autònoma de Barcelona. During his last year, he did external practises at the Electronic Microscopy Unit lead by Dr. Belén Ballesteros at ICN2. Also, he obtained his MSc in Advanced Nanoscience and Nanotechnology in the same university, with a master’s thesis devoted to the fabrication of plasmonic nanostructures for LiDAR applications.
He joined IMB-CNM-CSIC through a grant of the Spanish Ministerio de Economía y Empresa (MINECO) starting to work at the IMB-CNM-CSIC Nanolithography Laboratory on 2016 where he has worked with different characterisation and fabrication techniques such as SEM, AFM, EBL and, recently, LL.